Advances in CMP/polishing technologies for the manufacture of electronic devices
Doi Toshiro K., Marinescu Ioan D., Kurokawa SyuheiKniha
Citace v seznamu literatury:
DOI, Toshiro K.; MARINESCU, Ioan D. a KUROKAWA, Syuhei. Advances in CMP/polishing technologies for the manufacture of electronic devices. Oxford: Elsevier, 2012. ISBN 9781437778601. Dostupné také z: https://proxy.k.utb.cz/login?url=http://app.knovel.com/hotlink/toc/id:kpACMPPTM3/advances_in_cmppolishing_technologies_for_the_manufacture_of_electronic_devices.